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Semiconductor & Electronics

Microsecond-level signal capture and quality tracing

Capture subtle fab signals at microsecond resolution and trace anomalies and yield drops early. Supports the SECS/GEM standard.

Yield shows up in subtle signals first. Connect fab equipment directly over the SECS/GEM standard and accumulate even small cleanroom drifts as time series — and the data warns you of yield degradation before it lands.

A Challenges

01

Ultra-high-frequency signal capture

02

Tracing yield-drop causes

03

Cleanroom environment monitoring

04

On-premises processing for data that cannot leave the fab

B How PlantPulse helps

SECS/GEM collection

Connect fab equipment directly with the SECS/GEM standard (SEMI E5/E30/E37).

High-frequency edge processing

Capture subtle signals at high speed on the edge and compute derived metrics instantly.

Yield forecasting & anomaly detection

Catch subtle anomalies and yield drops early with AI forecasting and anomaly detection.

Cleanroom time-series analytics

Compare long-term environmental-sensor trends against baselines to catch subtle drift and degradation early.

Process–lot traceability

Link process, lot, and equipment history through the ontology to back-trace the impact scope of quality issues.

Utility peak monitoring

Continuously watch cleanroom HVAC and compressed-air peaks with early alarms before thresholds are exceeded.

SECS/GEM

SEMI E5·E30·E37 standard

µs-class

signal capture resolution

512K

CEP events/sec

24/7

continuous cleanroom watch

C Where it applies

Fab · front-end

Connect equipment directly as a SECS/GEM host to collect events, states, and subtle signals in standard form.

Standard direct-to-tool collection

Cleanroom

Tie environmental sensors and equipment signals into one time-series foundation to analyze the downstream impact of subtle changes.

Early awareness of subtle anomalies

Back-end · packaging

Unify heterogeneous assembly and inspection equipment and trace per-lot quality history.

Faster yield-drop root-cause tracing

C Outcomes

  • Early subtle-anomaly detection
  • Yield forecasting
  • Quality tracing

D Related products

D FAQ

Can we connect without tool-vendor involvement?

Equipment supporting SECS/GEM is collected directly over a host connection. For non-standard equipment, PLC and sensor signals are collected in parallel with the 42 built-in drivers.

Does fab data have to leave the site?

No. Both the platform and the AI run fully on-premises, so data never leaves the site — suitable for fabs with strict no-egress policies.

Won't high-frequency collection load the tools?

Host communication follows the SECS/GEM specification with per-tool polling adjustment, and preprocessing and derived metrics run on the edge to reduce upstream load.

See it live on real operating screens

A 15-minute demo walks you from ingest to AI. Check the fit for your plant with an expert, right away.